Effects of Process Conditions on Properties of Electroplated Ni Thin Films for Microsystem Applications

نویسندگان

  • J. K. Luo
  • M. Pritschow
  • A. J. Flewitt
  • S. M. Spearing
  • N. A. Fleck
  • W. I. Milne
چکیده

Effects of Process Conditions on Properties of Electroplated Ni Thin Films for Microsystem Applications J. K. Luo, M. Pritschow, A. J. Flewitt, S. M. Spearing,* N. A. Fleck, and W. I. Milne Department of Engineering, University of Cambridge, Cambridge CB3 0FA, United Kingdom Institute for Microelectronics Stuttgart, 70569 Stuttgart, Germany School of Engineering Science, University of Southampton, Southampton SO17 1QJ, United Kingdom

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تاریخ انتشار 2006